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Thin Film Formation Equipment (E-Beam and Plasma Sources, etc.)

Deposition device, deposition components, and thermal spray components.
Our products are characterized by their ability to deposit high quality films with low damage.

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Electron Beam Source／Bombardment Deposition Source (Vacuum Deposition)
Plasma Source (Film Deposition Assist／Modification)
Crystal Oscillator Film-Thickness Controller (Measurement of Deposition Rate)
Fine Powder Feeder (Film Formation such as Thermal Spray)

Electron Beam Source／Bombardment Deposition Source (Vacuum Deposition)

BS/JEBG/EBG series Electron Beam Source

BS/JEBG/EBG seriesElectron Beam Source

BS-60610BDS Bombardment Deposition Source

BS-60610BDSBombardment Deposition Source

BS-60250DEM Electron Beam Source

BS-60250DEMElectron Beam Source

BS-60211DEM/BS-60210DEMElectron Beam Source

JST-F series Electron Beam Power Supply

JST-F seriesElectron Beam Power Supply

JEBG series High-power electron beam sources

JEBG series High-power electron beam sources

Plasma Source (Film Deposition Assist／Modification)

BS-80020CPPS Plasma Source for Low-temperature Process

BS-80020CPPSPlasma Sourcefor Low-temperature Process

BS-80011BPG High-power Plasma Source for high-density plasma

BS-80011BPGHigh-power Plasma Sourcefor high-density plasma

Crystal Oscillator Film-Thickness Controller (Measurement of Deposition Rate)

BS-04series Rotary Sensor

BS-04seriesRotary Sensor

Fine Powder Feeder (Film Formation such as Thermal Spray)

TP-99260FDR Powder Feeder

TP-99140FDR Fine Powder Feeder

TP-99140FDR Fine Powder Feeder

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DEVELOPMENT /
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JEOL provides a variety of support services to ensure that our customers can use our products with peace of mind.
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