Less damage of Backscattered electrons and X-ray/Splash reduction/Large capacity liner/High-rate deposition
BS-60610BDS is a unique deposition source that indirectly heats an evaporation material in a liner with electron beam.
The liner capacity and deposition rate have increased compared to the conventional model of BS-60310BDS.
No damage to the substrate due to backscattered electron and X-rays.
Suitable for low-defect film deposition with little splash.
Excellent deposition rate control and stability is realized by high-speed electron beam heating control.
Thick film deposition by Increasing liner capacity.
Higher deposition rates are possible by increasing the maximum output and the evaporation area compared to BS-60310BDS.
Principle of evaporation
Liner capacity/Comparison of maximum deposition film thickness*
In the case of the distance of source to substrate is 1100 mm
|Liner capacity Fluoride
|Liner capacity Aluminum
|Max film thickness MgF2
|Max film thickness LaF3
|Max film thickness AI
Residue after evaporation
Comparison of presence of particles in the deposited MgF2 film
UV band spectral characteristics of MgF2 single layer
Aluminum deposition rate at each e-beam power
Example of electron beam sweep pattern
|Maximum 4.8kW ※1
|4 to 5L / min, 10 to 25°C
|5×10-5 to 1×10-2Pa
|EB Power Supply
|BS-720xxICE series with Advanced Circle Scan mode
|Bombardment Deposition Source 6-liner type ※2, ※3
|Liner（for fluoride, Au, Ag, Cu, etc.）
The maximum output depends on the liner type.
Liners are not included in BS-60610BDS.
Please use the optional liners as the liner effects the deposition performance.
The number of liners can be changed as a custom-built product.
Used to suppress the temperature rise of the substrate.
Need to select either the Cover(recommended) that improves heating efficiency or the Spacer.