JPS-9200 Photoelectron Spectrometer
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This is a high-sensitivity photoelectron spectrometer for general application, with a wide analysis range from 3µm&phi to 3mmφ.
Features
Micro Ion Gun
A highly precise ion etching gun with JEOL-unique electron optics technology.
The narrow etching area, enables repeated measurement of the same specimen.
Hybrid Input Lens System
General purpose analysis from micro area to a high area free from specimen damage is now possible, by changing the detection area as desired, instead of focusing the x-rays.
Data analysis software for surface analysis
Besides our conventional waveform separation method, new waveform separation algorithms using the actual spectrum and utilizing the standard spectrum library of XPS and AES have been incorporated. This frees operators from complicated parameter settings that require experience and expertise, making it possible for even a novice to carry out complicated chemical bonding state analysis.
Specifications
| Resolution and intensity for spectrum | ||
|---|---|---|
| Ag3d5/2photoelectron peak (equivalent to 300 W MgKa excitation) The distance between the points at 16% and 84% of the full intensity, which are obtained by line profiling of a specimen scanned perpendicular to the slit, is taken as the analysis diameter (spatial resolution). |
||
| Analysis diameter | 0.9 eV | 1.15 eV |
| Macro | 900,000 cps or more | 1,800,000 cps or more |
| 1mm dia | 480,000 cps or more | 900,000 cps or more |
| 0.2mm dia | 50,000 cps or more | 100,000 cps or more |
| 0.03mm dia | 1,500 cps or more | 3,000 cps or more |
| Al/Mg twin anode Maximum power Mg 500W, Al 600W When using monochromatic X-ray source Ag3d5/2photoelectron peak (equivalent to 600 W AlKa excitation) |
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| Intensity (cps) | 100,000 cps or more | |
| Resolution (eV) | 0.65 eV | |
| Input-lens system | Combined electromagnetic and electrostatic lenses with a field-of-view and acceptance-angle apertures | |
| Detector | Multi-channel detector | |
| Energy sweep range | 0～1480 eV | |
| Pass energy (CAE) | 5 to 200 eV | |
| CRR | ΔE/E 0.15 to 0.5 % | |
| Standard holder | 10 mm x 10 mm x 2 mm (thick) maximumUp to six specimens can be loaded simultaneously | |
| Large holder | 90 mm diameter 1.5 mm (thick) maximum | |
| Specimen movements | X: 0 to 50 mm; Y: 0 to 18 mm,Z: –2 to 2 mm; T: –10 to 10° | |
| Ultimate pressure in analysis chamber | 7×10-8 Pa | |
Application
Application JPS-9200
More Info
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