JPS-9010 Photoelectron Spectrometer
DISCONTINUED
A well-balanced multifunction photoelectron spectrometer equipped with high-speed etching gun and twin anode monochromator, which also realizes low cost.
Features
Kauffmann Type Ion Gun
A high-speed ion gun enabling etching of 10 mm areas at a rate of up to 120 nm/min. The performance, which is superior to ion milling, can fulfill various objectives, from surface cleansing to depth.
Pan Focus Input Len System
A high-operability system has been realized without analyzer-unique complicated operations, such as specimen positioning and adjustment of the electron optics system.
Data analysis software for surface analysis
Besides our conventional waveform separation method, new waveform separation algorithms using the actual spectrum and utilizing the standard spectrum library of XPS and AES have been incorporated. This frees operators from complicated parameter settings that require experience and expertise, making it possible for even a novice to carry out complicated chemical bonding state analysis.
Specifications
| Sensitivity and resolution | |
|---|---|
| Ag3d5/2 photoelectron measured on a clean and flat Ag sample Standard X-ray source(equivalent to 300W MgKαexcitation) |
|
| Sensitivity（cps） | Resolution（eV） |
| 540,000 | 0.90 |
| 1,800,000 | 1.15 |
| 5,000,000 | 1.8 |
| Monochromatic X-ray source(equivalent to 600W AlKα excitation) | |
| Sensitivity（cps） | 65,000 |
| Resolution（eV） | 0.65 |
| X-ray source | |
| Standard X-ray source (Al/Mg twin target) | |
| Maximum power | Mg 500W Al 600W |
| Energy analyzer and incident lens system | |
| Incident lens | 3-step cylindrical electrostatic lens |
| Energy sweep system | Constant analyzer energy method |
| Vacuum evacuation system | |
| Ultimate pressure | 7×10-8Pa or less |
| Bakeout mechanism | Inner heater built-in, automatic control |
Application
Application JPS-9010series
A New Specimen Treatment Chamber for XPS and Its Applications
More Info
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