Reliable Low-Temperature Control for ESR Measurements
The Liquid Helium Variable Temperature System “ES-13130HEVT/BU" is designed for ESR/EPR measurements requiring stable and precise temperature control over a wide range from 2.5 K to 420 K. The system supports studies of semiconductor defects, magnetic materials, spin dynamics, and photoexcited states with fast cooling performance and excellent temperature stability.
Features
Wide Variable Temperature Range
The system provides precise temperature control from 2.5 to 420 K using liquid helium, enabling a broad range of low-temperature ESR experiments.
Variable temperature range: 2.5 to 420 K*
Using liquid nitrogen: 80 to 420 K
* An additional rotary pump is required for experiments conducted below 4.2 K.
Excellent Temperature Stability
A temperature stability of ±0.5 K enables highly reproducible ESR measurements, even for temperature-sensitive signals.
Easy and Quick Setup
The system can be assembled in approximately 20 minutes, allowing efficient preparation for routine low-temperature measurements.
Fast Cool-Down
Cooling from room temperature to 4.2 K can be achieved in approximately 15 minutes, minimizing waiting time before measurements.
Compatible with Ultraviolet Radiation Apparatus
The system can be used together with ultraviolet radiation apparatuses such as:
ES-13080UV2A
ES-13090UV04
Related Products
This enables ESR measurements under UV irradiation for the investigation of photoexcited states and defect centers.
Composition
Cryostat(including heater and temperature sensor)
Transfer line(including dewar adapter)
Flow meter
Temperature controller
Assembly fixtures and spare parts
Application
ESR Signal of Silicon Dangling Bond
Low-temperature ESR measurements enable sensitive detection of ESR signals originating from silicon dangling bonds. Temperature-dependent analysis is useful for semiconductor material characterization and interface defect studies.
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