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A beam sweep controller for performing 2- or 3-source simultaneous deposition using a single electron gun.
Features
Used with the JST-F series power supplies to enable 3-source deposition with a single electron gun. Three adjacent spots in the crucibles are subjected to high-speed exposure from the electron beam (1 cycle 10 ms). (Crucible A → Crucible B → Crucible C → Crucible A…)
Each of the beam exposure times can be set by specifying an output ratio (A:B:C)
It is also possible to set the sweep width and position for each exposure location.
More Info
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