Miniaturization of feature sizes for Optical Proximity Correction (OPC) masks and phase shift masks is accelerating, according to the International Roadmap for Semiconductor Technology. To achieve high-quality testing required to produce these high-performance masks, JEOL now offers the Holon Mask CD-SEM models EMU-220 and EMU-330.

Features

• Highly stable observation and measurement of patterns on NGL photo masks
• High-precision measurement by electrostatic EB scan
• Charge neutralizer for low charge control
• Anti-contamination device for low contamination
• Image measurement system