We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths. Whether your applications are for next generation and beyond, production of ultra-high accuracy reticles and FET devices, ASIC fabrication, or direct pattern lithography on wafers, JEOL has a solution. We also offer an FEG SEM that is expandable for simple lithography and research applications.
Available Models
| |
Emitter |
Accelerating Voltage |
Min. Beam Size |
Wafer Size |
Beam Shape |
Deflection |
| JBX-3050MV |
LaB6 single crystal |
50 kV |
|
Substrate Size: 6 inch mask |
Variable shaped |
Vector scan |
| JBX-5500FS |
ZrO/W
TFE |
50 kV / 25 kV |
2nm |
100mm wafer |
Spot |
Vector scan |
| JBX-6300FS |
ZrO/W (Schottky) |
100 kV / 50 kV / 25 kV |
2nm |
Up to 200mm wafer |
Spot |
Vector scan |
| JBX-9300FS |
ZrO/W (Schottky) |
100 kV / 50 kV |
4nm (100 kV)
7nm (50 kV) |
Up to 300mm wafer |
Spot |
Vector scan |