The plasma sources are incorporated into a vacuum chamber and generate high-density plasma. The plasma sources can be used as Ion Plating, Plasma Assisted Deposition, and it is possible to improve film properties for optilcal thin films, protective films and function films. Because high-density plasma can be generated in a mass space, high-rate deposition to a large area is possible

BS-80011BPG: High-power Plasma Source for high-density plasma
BS-80020CPPS: Plasma Source for low-temperature process