The use of plasma for enhancing the quality and function of thin film production by physical vapor deposition (PVD) and chemical vapor deposition (CVD) is becoming indispensible. The Built-in Plasma Source is compact, and can be easily employed in the plasma assisted vapor deposition process.
 |
 |
| EPG-3010 |
BS-80011BPG |
Features:
- Thermal cathode arc discharge
- Two types of output beams
- reflected beam
- irradiation beam