JEOL BS-60050EBS Electron Beam Source with reduced backscattered electrons

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Sunday, July 06, 2008
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BS-60050EBS Electron Beam Source with reduced backscattered electrons

Electron source minimizing backscattered electrons entering substrate.
Reduces film absorption.
External accelerating voltage selection while keeping high vacuum.
Wide beam scanning range up to 50 mm in diameter.
Incorporates a 270° permanent magnet, electromagnet, and long lasting filament.
Simple design featuring contamination resistance and easy maintenance.

[ view product brochure ]

BS-60050EBS Key Product Features

Maximum power	10 kW (1A at 10 kV)
Accelerating voltage range	-4 to -10 kV
Beam deflection angle	270° (permanent magnet and electromagnet used)
XY scan width	Maximum 50 mm in diameter (at -6 kV)
XY movement	Maximum 50 mm in diameter (at -6 kV)
Scan frequency	X: 50 Hz; Y: 500 Hz
Working pressure	7.0x10^-2 to 5.0x10^-5 Pa
Cooling water	5 to 8 lit/min (temeperature 10 to 25°C) Differential pressure: 0.15 to 0.3 MPa
Outer dimensions	177(W) x 284(D) x 140(H) mm
Weight	Approx. 14kg
Applicable power supplies	JST-3F, JST-10F, JST-16F

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