XPS for Surface Analysis

X-ray Photoelectron Spectroscopy (XPS) is an analytical technique to estimate the elemental composition and chemical state of the elements on the surface of a material by projecting soft X-ray onto the surface and detecting the energy of photoelectrons emitted from areas a few nm from the surface.

The photoelectron energy detected is specific to a certain element, and is determined by chemical bonding, reflecting chemical shift. Using X-rays as the source of excitation, XPS is effective in analyzing insulators.

XPS is a powerful analytical tool for material development and surface testing of a wide range of samples, including metals, semiconductors, high polymers, and advanced materials.

The JPS-9010 series offers three models to meet various research objectives and requirements: JPS-9010MC (with monochromatic X-ray source), JPS-9010MX, and JPS-9010TR featuring X-ray total reflection photoelectron spectroscopy (TRXPS), one of the first to incorporate this technique.

• High accuracy energy analyzer
• X-ray source to minimize damage to samples
• Compact X-ray monochromator
• Ultra high clean vacuum system; easy baking
• Versatile auto analysis to support routine analysis
• Large stage to accommodate large samples such as hard disk
• Easy to use software
• High speed peak separation software

Sensitivity and Resolution

	Intensity (cps)	Resolution (eV)
Standard X-ray Source*	540,000	0.90
	1,800,000	1.15
	5,000,000	1.8
Monochromatic X-ray Source**	60,000	0.65

* When 3d5/s photoelectron spectra are acquired from a clean, flat silver sample with MgKa ray (converted to 300 W)
** When 3d5/s photoelectron spectra are acquired from a clean, flat silver sample with AlKa ray (converted to 600 W)

X-ray Source

Standard X-ray Source (Ai-Mg twin target)
Accelerating Voltage	Max. 12 kV
Emission Current	Max. 50 mA
Voltage Stability	Within 1%
Maximum Load	Mg 500W Al 600W
Monochromatic X-ray Source (X-ray monochromator)
Accelerating Voltage	Max. 12 kV
Emission Current	Max. 50 mA
Voltage Stability	Within 1%
Maximum Load	Al 600W
Analyzing Crystal	SiO2
Rowland Circle	200 mm

Energy Analyzer and Incident Lens System

Incident Lens	3 stage cylindrical electrostatic lens
Hemispherical Analyzer	Central orbit 100 mm
Incident Slit	Slit width controller incorporated
Magnetic Shield	Double mu metal shield
Energy Sweep	Constant analyzer energy
Sweep Range	0 to 1480 eV
Energy Position Reproducibility	±0.05 eV
Detector	Micro channel plate
Counting System	Pulse count

Vacuum System

Sample Imaging
Ultimate Pressure	7x10-8 Pa (5x10-10 Torr) maximum
Vacuum System	Auto evacuation / baking sequence
Main Pump	200 lit/s ion pump
Supplementary Pump	1600 lit/s sublimation pump
Vacuum Monitor	Nude ion gauge
Baking System	Heater integrated
Specimen Exchange Chamber
High Speed Ion Gun	Incorporated
Vacuum System	Auto evacuation baking/sequence
Main Pump	2601 lit/s turbo molecular pump
Vacuum Monitor	Penning gauge

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