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   PRODUCTS : Electron Optics : MultiBeam (SEM-FIB) : JIB-4601F  
Electron Optics
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JIB-4601F MultiBeam System

JEOL JIB-4601FAll in one tool - Various applications are offered with one instrument:

  • Optimum-geometry specimen chamber for all functions of FIB milling, SEM imaging, and EDS/EBSD analyses
  • High-accuracy thin-film preparation achieved by combination with high-resolution SEM
  • Fast wide-area milling with large FIB ion-beam current up to 60 nA
  • Installation of up to 3 gas guns for protective-film creation and wiring modification
  • Real-time monitoring of the progress of FIB milling observed by high-resolution SEM
  • High-speed analysis with large probe current up to 200 nA by a robust thermal FEG

 

  
JIB-4601F Specifications

FIB

Ion source Ga liquid metal source
Accelerating voltage 1 to 30 kV (in steps)
Magnification 30x (for searching field)
100 to 300,000x
Image resolution 5 nm (at 30 kV)
Beam current Up to 60 nA (at 30 kV)
Movable aperture 12 steps (motor driven)
Ion beam shapes during milling Rectangle, Line, Spot, and BMP

SEM

Accelerating voltage 0.2 to 30 kV (in steps)
Magnification 20 to 1,000,000x
Image resolution 1.2 nm (at 30 kV)
3.0 nm (at 1 kV)
Beam current 200 nA
Specimen stage Goniometer stage
X: 50 mm; Y: 50 mm; Z: 1.5 to 40 mm; T: -5 to 70°; R: 360°
Vacuum pump SIP x2 (SEM), x1 (FIB)
TMP x1, RP x1
  
JIB-4601F Optional Attachments
  • EDS (Energy Dispersive X-ray Spectrometer)
  • EBSD (EBSD System)
  • CLD (Cathodoluminescence Detector)
  • IRCAM (IR Camera for Specimen Chamber)
  • GIS (Gas Injection System)
  • PCD (Probe Current Detector)
  • AEM (Absorbed Current Meter)
  • TED (Transmission Electron Detector)
  • BEI (Backscattered Electron Detector)

 

  

 
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