The JIB-4501 is a multi beam SEM-FIB system capable of surface/internal 3D imaging and analysis in a single unit. Featuring an optimum design, the system supports a complete operation from FIB milling to SEM imaging to various analysis including EDS and EBSD.
Features
- High performance LaB6 SEM + High performance/high probe current FIB
- Simple operation of surface/internal 3D imaging and analysis in a single unit
- Optimum design for a complete operation from FIB milling to SEM imaging to various analysis including EDS and EBSD
- Real time monitoring of FIB milling in SEM
- Standard auto milling recipes for unattended sample preparation
- Supports multiple gas injection systems for protective film deposition
- Low vacuum operation to protect non conductive samples from charge accumulation
Specifications
| FIB (Focused Ion Beam) |
| Ion Source |
Ga liquid metal ion source |
| Accelerating voltage |
1 to 30 kV |
| Magnification |
30x (view area search), 100 to 300,000x |
| Image resolution |
5 nm (at 30 kV) |
| Beam current |
0.5 pA to 60 nA (at 30 kV) |
| SEM (Electron Beam) |
| Accelerating voltage |
0.3 to 30 kV |
| Magnification |
5 to 300,000x |
| Image resolution |
2.5 nm (at 30 kV) |
| Beam current |
1 pA to 1 µA |
| Specimen stage |
Goniometer stage
X: 76 mm
Y: 76 mm
Z: 5 to 48 mm
T: -10 to 90°
R: 360°
|
Accessories
- EDS (energy dispersive X-ray spectrometer)
- EBSD (EBSD system)
- CLD (cathode luminescence detector)
- SCS (chamber scope)
- GIS (gas injection system)