JEOL Ltd. (Yoshiyasu Harada, President) announced a new high throughput SEM/FIB, JIB-4500, to be distributed on December 26, 2007.

[Background]

As technologies for materials development and processing advance, high precision analysis is in increasing need, requiring simple, speedy data acquisition from a variety of samples.

In response to these ubiquitous needs, we developed MultiBeam (model JIB-4500), which combines Focused Ion Beam micro milling with the high resolution imaging of the JEOL LaB6 electron column and represents JEOL's expertise and experience in electron and ion optics over the years.

[Features]

1. LaB6 gun as standard
   The long lasting gun assures high resolution imaging.
2. Low vacuum SEM mode as standard
   The low vacuum mode is effective for imaging of non conductive samples susceptible for charge accumulation.
3. Large current mode (30 nA)
   For high FIB throughput
4. Simultaneous viewing of milling process with real time monitor
   The milling process is simultaneously viewed and analyzed in SEM imaging, effective for inner structure analysis and TEM thin film sample preparation.
5. A complete set of ports for full support of your applications
   Large stage accommodating samples up to 75 mm; various detectors including EDS, EBSD, and CLD

[Specifications]

FIB

Ion source	Ga liquid metal ion source
Guaranteed resolution	5 nm or less (30 kV)
Accelerating voltage	1 to 30 kV (in steps)
Magnification	30x (wide area) 100 to 300,000x
Maximum beam current	30 nA (at 30 kV)

SEM

Electron Gun	LaB6
Guaranteed resolution	2.5 nm (at 30 kV)
Accelerating voltage	0.3 to 30 kV (in steps)
Magnification	5 to 300,000x
Maximum beam current	1 uA (at 30 kV)