JEOL Ltd. (Yoshiyasu Harada, President) announced a new model of dual beam milling/imaging scanning microscope, JIB-4600F, to be distributed in May 2008.
[Background]
As technologies for materials development and processing advance, high resolution imaging and high precision analysis of cross sections are in increasing demand, requiring simple, speedy data acquisition from a variety of samples. The JIB-4600F, a powerful multi beam milling/imaging system, is the answer to these applications.
[Features]
- “In-lens thermal FEG”
Highly stable probe current and aperture control lens facilitate high resolution image acquisition. - High speed analysis at high current
Speedy mapping at a current of 200 nA at maximum - Large current mode (30 nA)
For high FIB throughput at high current - Simultaneous viewing of milling process with real time monitor
Simultaneous viewing of the milling process in SEM imaging, effective for inner structure analysis and TEM thin film sample preparation - A complete set of ports for full support of your applications
Large stage accommodating samples up to 50 mm in diameter, detectors including EDS, EBSD, and CLD effective for analysis of sample surfaces and cross sections.
[Specifications]
FIB
| Ion source |
Ga liquid metal ion source |
| Guaranteed resolution |
5 nm or less (accelerating voltage 30 kV)
|
| Accelerating voltage |
5 to 30 kV (in steps) |
| Magnification |
30x (wide area)
100 to 300,000x |
| Maximum beam current |
30 nA |
SEM
| Electron Gun |
In-lens thermal electron gun |
| Guaranteed resolution |
1.2 nm (at 30 kV)
|
| Accelerating voltage |
0.2 to 30 kV (in steps) |
| Magnification |
50x to 1,000,000x |
| Maximum beam current |
200 nA |