host posted on December 12, 2010 22:18
FOR IMMEDIATE RELEASE
JEOL Ltd. (Gon’emon Kurihara, President) announced a new model of focused ion beam milling/imaging system, JIB-4000, to be distributed in December 2010.
[ Background ]
As technologies for development and processing of materials advance, speedy imaging and analysis of samples as well as easy data acquisition are in increasing demand. JEOL's new focused ion beam system, JIB-4000, is a powerful sample preparation tool designed to answer this demand.
[ Features ]
- High speed fabrication
A high ion beam current enables speedy sample fabrication.
- Minimum damage
Processing at low accelerating voltage minimizes damage on samples.
- Safety
Each operator logs in to the system to access and manage individual control sequences. The energy saver mode is provided to minimize wasteful consumption of Ga ions after milling is finished.
- Extensive GIS
Up to 2 GIS units supported; gas application varied according to research objective.
- Small footprint
Compact, space saving column and operation consoles.
[ Specifications ]
| Ion source |
Ga liquid metal ion source |
| Guaranteed resolution |
5 nm (accelerating voltage: 30 kV) |
| Maximum beam current |
60 nA (accelerating voltage: 30 kV) |
| Accelerating voltage |
1 to 30 kV |
| Specimen movement mechanism |
5 axis motor stage (standard) |
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JEOL Ltd.
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com, or call +81-42-543-1111.