JEOL’s advanced electron beam and plasma technologies are enabled to create high-quality, high-performance thin films and materials.
High-Power Electron Beam Source
High-power EB sources are used for vacuum deposition (wide films or large plate) or melting of high-melting point metals.
Electron Beam Source
Electron beam sources for vacuum deposition of metal and oxides films. We offer a wide variety of EB sources and crucibles.
Plasma source can be incorporated into the vacuum chamber and generate high-density plasma. The plasma source can be used as Ion plating (plasma assisted deposition) for thin films.
Multi-crystal sensors for crystal oscillation type film thickness controller. It's used to monitor a deposition rate and film thickness in a vacuum deposition process.
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